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Controlled Ion Beam Deposition supplied by Electrospray (ES-CIBD) - enabling UHV deposition of large, reactive or fragile building blocks for functional nano-architectures

Date: 2024-11-21
Time: 10:00
Venue: M253
Speaker: Dr. Andreas Walz

Technical University of Munich, Munich, Germany
pureions GmbH, Gilching, Germany

报告摘要:

Cutting-edge research in the field of nanoelectronics, solar technology, catalysis and nano-scale bio-applications requires control and unbiased understanding of their structure and composition. Standard deposition techniques for their underlying building blocks restrict possible candidates: Thermal evaporation in vacuum (MBE, OMBE) is limited to volatile substances. Solution-based techniques such as drop casting, spin coating or inkjet printing operating in wet environments are versatile but often lack purity and quality.

Electrospray ionization (ESI) combined with mass selection and soft-landing of molecules unravels the vast potential of large, reactive or bio-relevant building blocks. The pool of possible molecules spans the whole chemical spectrum from small organic molecules up to several kilo- and megadalton proteins, DNA or even entire virus particles on one hand, but also inorganic clusters and larger nanoparticles on the other hand.

In-line with this, we present an UHV ion beam deposition device and its functionalities. Successfully processed examples originating from various chemical groups are discussed, comprising GNRs, foldamers, porphine derivatives and nucleic acids [1,2,3]. The main body of the device contains RF-steered ion guides with high transmission (>80% efficiency). A digital square-wave quadrupole mass filter provides virtually unlimited m/z-range. The footprint is benchtop in size, about 0,5 x 1 m.

[1] Analytical Chemistry 2022 94 (22), 7767-7778

[2] Angew. Chem. Int. Ed. 2022, e202111816

[3] Chem. Commun., 2022,58, 8938-8941

报告人简介:

Dr. Andreas Walz from Munich in Germany is a physicist by training and graduated at the Technical University Munich. His academic career was so far centered at the Chair of Prof. Dr. Johannes Barth for Surface and Interface Physics (E20).

In 2020, He completed his doctoral thesis with Prof. Barth as supervisor with summa cum laude and he continued his scientific work in the field of ion beam deposition methods there as a post-doctoral researcher. Together with his later founding colleagues, they worked on the development of powerful ion beam deposition devices which enables the deposition of non-volatile and fragile building blocks for functional nanostructures in UHV.

This innovative and promising technology overlaps a variety of facets in physics, chemistry and engineering. Major parts of his work deal with the physics, manufacturing and electric control of deposition devices, ion guides and mass spectrometers.

They raised some public grants to bring the technology forward towards a versatile and user-friendly tool. Last year, they founded a startup company pureions GmbH aiming to provide the technology to the nanotech and surface science community.

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